O processo levou 3 semanas. Fui entrevistado pela Equifax (Atlanta, GA) em fev. de 2020
Entrevista
The whole process took about three weeks. I had a 30 minute interest call with a recruiter, then a 30 minute technical phone interview by an engineer. I was invited to an onsite interview, which was booked for the following week. The onsite consisted of five back to back one-on-one interviews with team members and managers, encompassing theoretical and applied technical questions, workstyle questions, and questions about my background. I received a rejection email one week after the interview.
Perguntas de entrevista [1]
Pergunta 1
Fraudsters often craft online presences for their fake identities including social media accounts. What kinds of features could you extract from a borrower's social media account for use in a predictive model of credit fraud?
Candidatei-me por meio de recrutador(a). Fiz uma entrevista na empresa Equifax.
Entrevista
3 interviews, one intro call with HR, one with hiring manager and teammate together and one with managers manager. It was overall an easy process which consisted mostly of explaining projects and experience
Perguntas de entrevista [1]
Pergunta 1
Give an example of how you’ve interacted with clients and problem solved
There were three rounds of interview, two tech plus one hr. tech revolved around sql, statistics, machine learning algos and its metrics. Focus on personal projects was also given. overall, the focus was on basics and how you would fit in the company
Perguntas de entrevista [1]
Pergunta 1
My projects and how my interests and skills align with equifax
Candidatei-me por meio de uma faculdade ou universidade. O processo levou 1 semana. Fiz uma entrevista na empresa Equifax.
Entrevista
A short 30-minute interview covering behavioral questions and project/experience-related discussions. It may include challenges faced, problem-solving approaches, teamwork, leadership, technical contributions, key learnings, impact, collaboration, and adaptability in past roles or projects.